Facilities for
Material GrowthCompound
Semiconductor Laboratory has state
of the art facilities to carry out the epitaxial
growth, using 3 different types of Metal-organic Chemical Vapor
Deposition (MOCVD) systems. A complete set of rapid feedback
characterization tools including PL, XRD, SEM, TEM, and AFM are
available.
Please click the systems
to see the detailed information with pictures.
Thomas Swan MOCVD Reactor for InP
Thomas Swan MOCVD Reactor for GaAs
Customized MOCVD Reactor for GaN
Material Characterization Equipment
