Facilities

Material Growth
The Compound Semiconductor Laboratory has state of the art facilities to carry out the epitaxial growth, using 3 different types of Metal-organic Chemical Vapor Deposition (MOCVD) systems. A complete set of rapid feedback characterization tools including PL, XRD, SEM, TEM, and AFM are also available.

Thomas Swan MOCVD Reactor for InP
Thomas Swan MOCVD Reactor for GaAs and GaN

Device Processing

The W. M. Keck Photonic Research Lab is part of the Center for Photonic Technology group, consisting of fifteen faculty members and many student researchers. The focus is research and development of Photonic Materials, Devices, and Systems. The W. M. Keck Photonic Research Laboratory cleanroom is a 5000 square foot state of the art research facility devoted to enabling the fabrication of photonic, electronic, and micro-mechanical devices in compound and elemental semiconductors, polymersand, and other photonic materials. The main research space is for class 100 operation with a class 10 photolithography area. The facility is equipped with state of the art research tools for two-sided contact lithography, E-beam lithography, electron cyclotron reactive dry etching of semiconductors and insulation, E-beam metal deposition, E-beam and PECVD dielectric deposition, rapid thermal processing, oxidation diffusion and metrology.

Device Testing
A waveguide test system is available before packaging and as a routine evaluation procedure. Equipment is also available to carry out high-speed measurements of transfer characteristics at a variety of wavelengths from 1.3 to 1.6 mm. A complete set of measurement systems for edge emitting lasers (EEL) and vertical cavity surface emitting lasers (VCSEL) array is available.

Waveguide Testing System
EEL Testing System
VCSEL Array Testing System